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Roll-to-roll and other high-speed printing manufacturing processes are increasingly being extended to micro- and nanoelectronics and photonics due to cost and throughput advantages as compared with traditional wafer-scale manufacturing. The extra degrees of freedom associated with a moving web require high speed, in-line metrology to control the manufacturing process. Many state-of-the-art metrology approaches have sub-10 nm resolution but cannot be implemented during real-time fabrication processes because of environmental constraints or contact/cross sectional requirements. Optical angular scatterometry is a non-contact metrology approach that can be implemented at high speed. We demonstrate a system that uses 45° off-axis parabolic mirrors and an 8kHz resonant scanner to vary the incident/reflected angle from ~17° to ~67°, suitable for nanoscale metrology at web speeds of up to 350 cm/s, well-beyond the speed of current manufacturing tools. Scatterometry is sensitive not only to gross defects (missing pattern sections) but also to variations in nanoscale pattern details, offering a pathway to feedback control of the manufacturing process.